Tue 16 to Thu 18 Apr 2013

Photomask Japan

Photomask brings together engineers and investigators from Japan, USA, and all over the world in the field of photomasks, NGL masks, and related technologies to discuss recent progress, applications, and future trends. The conference program features invited papers, contributed papers, poster sessions, and a rump session with panel discussion. Display opportunities will be provided to mask manufacturing materials, and equipment companies.

Calendars with this event

Contact information

Organization: ICS Convention Design, Inc.

Phone: +81-3-3219-3541

Email: Pmjattoics-inc.Co.Jp